Computer simulation of the potential distribution inside the plasma chamber of negative ion source

Abstract

In the paper the computational method and results of simulation of potential distribution inside the plasma region of the negative ion source are presented. The code uses the well known PIC method [1] for the local charge density determination and finite differences method for the Poisson equation [2]. For simplification, the plasma model does not take into account the interaction between the plasma particles. The results of calculations are compared with the experimental data obtained for the RF negative ion source [3].